This seems about right. Progress was originally supposed to be 5-10 years. I’m not too sure on how effective these prototypes are. My guess is that their progress of EUV sources is quite far now, but that they’ll still need to have greater progress in regards to domestically created collector & debris mitigation systems, projection optics, mask blanks and other things.
Edit Addendum: Note, article agrees with the timeline of 5 years behind for China. Since their EUV source(presumably) works differently from ASML’s LPP EUV(many think China is going LDP route for EUV source), research may still go up to 10 years, as they will likely need to account for this when researching the other components in a full scanner. Alot of significant modifications or straight up new shit will have to be made. And even then, it’ll need to be commerically viable to compete with the West.
From what I know, Kanji can help with removing some ambiguity.